JPH0140338B2 - - Google Patents

Info

Publication number
JPH0140338B2
JPH0140338B2 JP56111000A JP11100081A JPH0140338B2 JP H0140338 B2 JPH0140338 B2 JP H0140338B2 JP 56111000 A JP56111000 A JP 56111000A JP 11100081 A JP11100081 A JP 11100081A JP H0140338 B2 JPH0140338 B2 JP H0140338B2
Authority
JP
Japan
Prior art keywords
acid
compound
printing plate
group
formaldehyde
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56111000A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5811932A (ja
Inventor
Takeshi Yamamoto
Sei Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP56111000A priority Critical patent/JPS5811932A/ja
Priority to US06/395,976 priority patent/US4442195A/en
Priority to EP82303710A priority patent/EP0070201B1/en
Priority to DE8282303710T priority patent/DE3262047D1/de
Publication of JPS5811932A publication Critical patent/JPS5811932A/ja
Publication of JPH0140338B2 publication Critical patent/JPH0140338B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP56111000A 1981-07-15 1981-07-15 感光性組成物 Granted JPS5811932A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP56111000A JPS5811932A (ja) 1981-07-15 1981-07-15 感光性組成物
US06/395,976 US4442195A (en) 1981-07-15 1982-07-07 Photosensitive composition and article with o-quinone diazide and 6-membered cyclic acid-anhydride
EP82303710A EP0070201B1 (en) 1981-07-15 1982-07-14 A photosensitive composite
DE8282303710T DE3262047D1 (en) 1981-07-15 1982-07-14 A photosensitive composite

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56111000A JPS5811932A (ja) 1981-07-15 1981-07-15 感光性組成物

Publications (2)

Publication Number Publication Date
JPS5811932A JPS5811932A (ja) 1983-01-22
JPH0140338B2 true JPH0140338B2 (en]) 1989-08-28

Family

ID=14549854

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56111000A Granted JPS5811932A (ja) 1981-07-15 1981-07-15 感光性組成物

Country Status (4)

Country Link
US (1) US4442195A (en])
EP (1) EP0070201B1 (en])
JP (1) JPS5811932A (en])
DE (1) DE3262047D1 (en])

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS616647A (ja) * 1984-06-20 1986-01-13 Konishiroku Photo Ind Co Ltd ポジ型感光性平版印刷版用感光性組成物
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
US4980264A (en) * 1985-12-17 1990-12-25 International Business Machines Corporation Photoresist compositions of controlled dissolution rate in alkaline developers
JPH07120039B2 (ja) * 1986-11-14 1995-12-20 富士写真フイルム株式会社 感光性組成物
US5182183A (en) * 1987-03-12 1993-01-26 Mitsubishi Kasei Corporation Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone
US4851265A (en) * 1987-12-22 1989-07-25 The Dow Chemical Company Surface modification of polymers to improve paint adhesion and agent therefor
JP2947519B2 (ja) * 1988-10-03 1999-09-13 コニカ株式会社 感光性平版印刷版
DE58908411D1 (de) * 1989-03-20 1994-10-27 Siemens Ag Hochauflösender Photoresist.
US5360693A (en) * 1989-03-20 1994-11-01 Siemens Aktiengesellschaft Positive o-quinone diazide photoresist containing base copolymer utilizing monomer having anhydride function and further monomer that increases etch resistance
US5227280A (en) * 1991-09-04 1993-07-13 International Business Machines Corporation Resists with enhanced sensitivity and contrast

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL218185A (en]) * 1957-06-17
GB1230771A (en]) * 1967-03-31 1971-05-05
AR205345A1 (es) * 1973-06-20 1976-04-30 Minnesota Mining & Mfg Composicion organofilica fotosensible y placa litografica preparada con la misma
US4009033A (en) * 1975-09-22 1977-02-22 International Business Machines Corporation High speed positive photoresist composition
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
US4307173A (en) * 1980-06-23 1981-12-22 American Hoechst Corporation Light-sensitive composition comprising phthalic anhydride
JPS57124341A (en) * 1981-01-27 1982-08-03 Toshiba Corp Formation of micropattern

Also Published As

Publication number Publication date
EP0070201B1 (en) 1985-01-23
JPS5811932A (ja) 1983-01-22
EP0070201A1 (en) 1983-01-19
DE3262047D1 (en) 1985-03-07
US4442195A (en) 1984-04-10

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